Technology transfer possible

Features

• - Photonic heating / sintering / UV curing / annealing 
  
• - High peak power using pulsed xenon flash lamp
  
• - Rapid Thermal Processing : Low Temperature Curing
• - Intense pulsed light ( IPL )
• - Includes flash lamp power supply
• - Easy Operating Software to Pulse Shaping
• - Good Uniformity with a High Efficiency Optical Reflector
• - Large area (158mm x 75mm) irradiation
  
• - Max radiant energy intensity  60J/cm²
• - Pulse enegry, max. 7100J
  
• - Integrated Energy Meter (Ophir)
• 
  

Applications

• Xenon flash lamp annealing
  
• Crystallization
• Xenon flash lamp curing
• Annealing of thin films
• Phase transformations
• Rapid thermal processing
• Amorphous silicon poly crystallization
• Silicon wafer annealing
• Xenon uv lamp curing
  
• Si, SiC substrate activation annealing
• Silver ( copper ) nano ink sintering, curing,
• Xenon pulse light sterilization
• 인쇄전자 나노 잉크 경화
  
• 광소결, 광경화, 가열, 살균
  
• 저온경화, 웨이퍼 급속 열처리 장비 (RTP)
  
• 제논 플래시 램프 어닐링 시스템 (FLA)